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KS 800 Multichamber

Multichamber cluster sputtering system, with etching chamber equipped with load-lock for wafer 6”- 8”samples.
Industrial and Research system, with source in cofocal configuration used for sputtering deposition and etching on wafer. Can work also in industrial production having a completely automatic load and unload of wafer in their box.
Mainly application are semiconductor field, optoelectronic, microelectronic, etc.

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